A high vapour velocity is required for high plate efficiency in a seive plate coloumn. The satisfactory value of operating vapor velocity for design purpose in seive plate column is about __________ percent of the flooding velocity.

Process Equipment and Plant Design
A high vapour velocity is required for high plate efficiency in a seive plate coloumn. The satisfactory value of operating vapor velocity for design purpose in seive plate column is about __________ percent of the flooding velocity.

45

80

60

95

45

80

60

95

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Process Equipment and Plant Design
Diameter of the seive tray column is determined by the

Lower limit of vapour velocity

Hole diameter of the seive tray

Upper limit of the vapour velocity

Height of the plate spacing

Lower limit of vapour velocity

Hole diameter of the seive tray

Upper limit of the vapour velocity

Height of the plate spacing

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Process Equipment and Plant Design
__________ tower is the most suitable gas-liquid contacting device involving highly corrosive fluids.

Packed

Sieve plate

None of these

Bubble cap plate

Packed

Sieve plate

None of these

Bubble cap plate

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Process Equipment and Plant Design
The thickness of segmental baffles (25 -35% cut truncated plates usually) is generally __________ the tube wall thickness.

Equal to

Half

Twice

Four times

Equal to

Half

Twice

Four times

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Process Equipment and Plant Design
A single pass air heater is connected to a two pass unit. For the air flow rate and other conditions remaining the same, the film heat transfer co-efficient for air will vary in the ratio of

None of these

2

20.8

20.2

None of these

2

20.8

20.2

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Process Equipment and Plant Design
25 per cent cut segmental baffle means that the baffle

Spacing is 75% of its height

Width is 25% of its height

Height is 25% of the I.D. of the shell

Height is 75% of the I.D. of the shell

Spacing is 75% of its height

Width is 25% of its height

Height is 25% of the I.D. of the shell

Height is 75% of the I.D. of the shell

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Process Equipment and Plant Design

Process Equipment and Plant Design A high vapour velocity is required for high plate efficiency in a seive plate coloumn. The satisfactory value of operating vapor velocity for design purpose in seive plate column is about __________ percent of the flooding velocity.

Process Equipment and Plant Design Diameter of the seive tray column is determined by the

Process Equipment and Plant Design __________ tower is the most suitable gas-liquid contacting device involving highly corrosive fluids.

Process Equipment and Plant Design The thickness of segmental baffles (25 -35% cut truncated plates usually) is generally __________ the tube wall thickness.

Process Equipment and Plant Design A single pass air heater is connected to a two pass unit. For the air flow rate and other conditions remaining the same, the film heat transfer co-efficient for air will vary in the ratio of

Process Equipment and Plant Design 25 per cent cut segmental baffle means that the baffle

Process Equipment and Plant Design
A high vapour velocity is required for high plate efficiency in a seive plate coloumn. The satisfactory value of operating vapor velocity for design purpose in seive plate column is about __________ percent of the flooding velocity.

Process Equipment and Plant Design
Diameter of the seive tray column is determined by the

Process Equipment and Plant Design
__________ tower is the most suitable gas-liquid contacting device involving highly corrosive fluids.

Process Equipment and Plant Design
The thickness of segmental baffles (25 -35% cut truncated plates usually) is generally __________ the tube wall thickness.

Process Equipment and Plant Design
A single pass air heater is connected to a two pass unit. For the air flow rate and other conditions remaining the same, the film heat transfer co-efficient for air will vary in the ratio of

Process Equipment and Plant Design
25 per cent cut segmental baffle means that the baffle