Process Control and Instrumentation The time constant of a first order process with resistance R and capacitance C is RC R + C 1/RC R - C RC R + C 1/RC R - C ANSWER DOWNLOAD EXAMIANS APP
Process Control and Instrumentation The __________ of a vapor pressure thermometer is a primary element. None of these Pointer Bulb Bourdon tube None of these Pointer Bulb Bourdon tube ANSWER DOWNLOAD EXAMIANS APP
Process Control and Instrumentation A proportional controller with a gain of Kc is used to control a first order process. The offset will increase, if Derivative control action is introduced Integral control action is introduced Kc is reduced Kc is increased Derivative control action is introduced Integral control action is introduced Kc is reduced Kc is increased ANSWER DOWNLOAD EXAMIANS APP
Process Control and Instrumentation Use of I-control along with P-control facilitates Reduction of offset Elimination of offset None of these Reduction of stability time Reduction of offset Elimination of offset None of these Reduction of stability time ANSWER DOWNLOAD EXAMIANS APP
Process Control and Instrumentation The root locus method, a pole of a transfer function G(s) is the value of s for which G(s) approaches -1 1 ∞ -1 1 ∞ ANSWER DOWNLOAD EXAMIANS APP
Process Control and Instrumentation Thermocouple in a thermal well behaves as a true Second order system (overdamped) Second order system (underdamped) First order system Multiple first order system Second order system (overdamped) Second order system (underdamped) First order system Multiple first order system ANSWER DOWNLOAD EXAMIANS APP
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