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Process Control and Instrumentation

Process Control and Instrumentation
Resistance of a gas in a vessel is given by (where, P = pressure, V = volume of the vessel, n = no. of moles of the gas, R = gas constant)

nRT/P
V/nRT
p/nRT
nRT/V

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Process Control and Instrumentation
Which of the following judges the accuracy of an instrument?

Static error
Drift
Dead zone
None of these

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Process Control and Instrumentation
What is the dynamic error in a critically damped second order instrument for a ramp input (AT)?

1.5 AT
0.5 AT
√AT
2 AT

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Process Control and Instrumentation
The transfer function for a P-D controller is

Kc/τD s
Kc τD s
Kc(1 +1/τD s)
Kc(1+τD s)

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Process Control and Instrumentation
Working principle of disappearing filament type optical pyrometer is based on the

Kirchoff's law
Seebeck effect
Wien's law
Peltier effect

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Process Control and Instrumentation
Gas chromatography is used for the measurement of

Pressure
Flow rate
Temperature
Concentration

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