Process Control and Instrumentation Resistance of a gas in a vessel is given by (where, P = pressure, V = volume of the vessel, n = no. of moles of the gas, R = gas constant) nRT/P V/nRT p/nRT nRT/V nRT/P V/nRT p/nRT nRT/V ANSWER DOWNLOAD EXAMIANS APP
Process Control and Instrumentation Which of the following judges the accuracy of an instrument? Static error Drift Dead zone None of these Static error Drift Dead zone None of these ANSWER DOWNLOAD EXAMIANS APP
Process Control and Instrumentation What is the dynamic error in a critically damped second order instrument for a ramp input (AT)? 1.5 AT 0.5 AT √AT 2 AT 1.5 AT 0.5 AT √AT 2 AT ANSWER DOWNLOAD EXAMIANS APP
Process Control and Instrumentation The transfer function for a P-D controller is Kc/τD s Kc τD s Kc(1 +1/τD s) Kc(1+τD s) Kc/τD s Kc τD s Kc(1 +1/τD s) Kc(1+τD s) ANSWER DOWNLOAD EXAMIANS APP
Process Control and Instrumentation Working principle of disappearing filament type optical pyrometer is based on the Kirchoff's law Seebeck effect Wien's law Peltier effect Kirchoff's law Seebeck effect Wien's law Peltier effect ANSWER DOWNLOAD EXAMIANS APP
Process Control and Instrumentation Gas chromatography is used for the measurement of Pressure Flow rate Temperature Concentration Pressure Flow rate Temperature Concentration ANSWER DOWNLOAD EXAMIANS APP