Chemical Reaction Engineering A pulse tracer is introduced in an ideal CSTR (with a mean residence time ι) at time, t = 0. The time taken for the exit concentration of the tracer to reach half of its initial value will be 2τ τ/0.693 0.5τ 0.693τ 2τ τ/0.693 0.5τ 0.693τ ANSWER DOWNLOAD EXAMIANS APP
Chemical Reaction Engineering The conversion of a reactant, undergoing a first order reaction, at a time equal to three times the half life of the reaction is 0.5 0.425 Data insufficient to calculate 0.875 0.5 0.425 Data insufficient to calculate 0.875 ANSWER DOWNLOAD EXAMIANS APP
Chemical Reaction Engineering The conversion XA and residence time data are collected for zero order liquid phase reaction in a stirred tank reactor. Which of the following will be a straight line? XA(1 - XA)Vs τ XA Vs . τ XA/(1 - XA)Vs τ XA Vs ln τ XA(1 - XA)Vs τ XA Vs . τ XA/(1 - XA)Vs τ XA Vs ln τ ANSWER DOWNLOAD EXAMIANS APP
Chemical Reaction Engineering N' plug flow reactors in series with a total volume 'V' gives the same conversion as a single plug flow reactor of volume 'V' for __________ order reactions. Third Any First Second Third Any First Second ANSWER DOWNLOAD EXAMIANS APP
Chemical Reaction Engineering The effectiveness factor for large value of Thiele modulus (L√(K/D1)) of a solid catalysed first order reaction is equal to (where, L = length of the reactor, cm, D1 = diffusion co-efficient, cm²/second) 1 L√(K/D1) ∞ 1/(L√(K/D1)) 1 L√(K/D1) ∞ 1/(L√(K/D1)) ANSWER DOWNLOAD EXAMIANS APP
Chemical Reaction Engineering Which of the following resistances is not involved in a gas phase catalytic (gas- solid) reaction? Gas film and pore surface diffusion resistances for products Surface phenomenon resistance Gas film and pore surface diffusion resistances for reactants Ash resistance Gas film and pore surface diffusion resistances for products Surface phenomenon resistance Gas film and pore surface diffusion resistances for reactants Ash resistance ANSWER DOWNLOAD EXAMIANS APP
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