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Process Control and Instrumentation

Process Control and Instrumentation
Phase lag of the frequency response of a second order system to a sinusoidal forcing function

Approaches 180° asymptotically
Is 30°
Is 120°
Is 90° at the most

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Process Control and Instrumentation
Pressure of 0.01 psi (absolute) can be measured by __________ gauge.

None of these
Pirani
Ionisation
Mcloid

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Process Control and Instrumentation
Working principle of disappearing filament type optical pyrometer is based on the

Seebeck effect
Wien's law
Kirchoff's law
Peltier effect

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Process Control and Instrumentation
Reset rate is the another term used for __________ time.

None of these
Dead
Derivative
Integral

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Process Control and Instrumentation
A sinusoidal variation in the input passing through a linear first order system

Gets amplified (magnitude increases)
Becomes more oscillatory (frequency increases)
Gets attenuated (magnitude decreases)
Becomes less oscillatory (frequency decreases)

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Process Control and Instrumentation
A non-linear chemical system is exemplified by a/an

Mixer
Non-isothermal CSTR
Isothermal CSTR
None of these

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