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Process Control and Instrumentation

Process Control and Instrumentation
Phase lag of the frequency response of a second order system to a sinusoidal forcing function

Is 90° at the most
Is 120°
Approaches 180° asymptotically
Is 30°

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Process Control and Instrumentation
The response of two tanks of same size and resistance in series is

None of these
Under damped
Over damped
Critically damped

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Process Control and Instrumentation
Which of the following controllers has maximum offset?

P-I controller
P-I-D controller
P-D controller
P-controller

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Process Control and Instrumentation
Working principle of radiation pyrometer is based on the

Wien's law
Seebeck effect
Stafan-Boltzman law
Kirchoffs law

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Process Control and Instrumentation
Which of the following relates the emf. generated in a single homogeneous wire to the temperature difference?

Peltier effect
Seebeck effect
None of these
Thomson effect

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Process Control and Instrumentation
Relationship between absorption/evolution of heat at the thermocouple junctions and the current flow in the circuit is given by __________ effect.

Seebeck
Thomson
Peltier
None of these

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