Process Control and Instrumentation A proportional controller with a gain of Kc is used to control a first order process. The offset will increase, if Derivative control action is introduced Integral control action is introduced Kc is increased Kc is reduced Derivative control action is introduced Integral control action is introduced Kc is increased Kc is reduced ANSWER DOWNLOAD EXAMIANS APP
Process Control and Instrumentation The response of two tanks of same size and resistance in series is Over damped None of these Under damped Critically damped Over damped None of these Under damped Critically damped ANSWER DOWNLOAD EXAMIANS APP
Process Control and Instrumentation What is the Laplace transform of impulse input having magnitude 'X' ? 1/X X² X 1 1/X X² X 1 ANSWER DOWNLOAD EXAMIANS APP
Process Control and Instrumentation Which of the following instruments is not used for measuring sub-zero (<0°) temperatures? Mercury in glass thermometer Radiation pyrometer Platinum resistance thermometer Vapor pressure thermometer Mercury in glass thermometer Radiation pyrometer Platinum resistance thermometer Vapor pressure thermometer ANSWER DOWNLOAD EXAMIANS APP
Process Control and Instrumentation Which of the following can measure temperatures in the range of - 20 to 300°C ? Vapor pressure thermometer Resistance thermometer Mercury in glass thermometer None of these Vapor pressure thermometer Resistance thermometer Mercury in glass thermometer None of these ANSWER DOWNLOAD EXAMIANS APP
Process Control and Instrumentation The root locus method, a pole of a transfer function G(s) is the value of s for which G(s) approaches -1 ∞ 1 -1 ∞ 1 ANSWER DOWNLOAD EXAMIANS APP