Process Control and Instrumentation
A proportional controller with a gain of Kc is used to control a first order process. The offset will increase, if

Kc is increased
Derivative control action is introduced
Integral control action is introduced
Kc is reduced

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Process Control and Instrumentation
The Laplace transform of exp(at), where a > 0, is defined only for the Laplace parameter, s > a since

The function exp(at) is piece-wise continuous only for s > a
The Laplace transform of integral of exp(at) has finite values only for s > a
The function is exponential
The Laplace transform integral of exp(at) has initial values only for s > a

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Process Control and Instrumentation
A magnetic flowmeter is

Based on the principle of Faraday's law
Capable of measuring the flow rate of slurries and electrolytes
All of these
Based on the linear relationship between the fluid flow rate and the induced voltage

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